Detailed Product Description

Light source: Xe Lamp

Wavelength range:250-1700nm

Beam Dia:1-3mm

incident angle:20-90,auto

Angle accuracy:0.01/step

Repeatability: Psi=+-0.01degree, delta=+-0.02degree

samply stage:160nm

Ellipsometry measures the change in polarization state of light that occurs upon reflection from or transmission through interfaces of different materials.  Analysis of ellipsometric data can be used to determine layer thickness, surface and interfacial roughness, sample anisotropy and optical constants (refractive index and extinction).  Its sensitivity is sufficiently high to allow detection of monolayers of small molecules on surfaces, and, as with many optical methods, it is nondestructive.

Pending sufficient user interest, grants may be pursued to buy various add-ons to expand research functionality such as wider wavelength range (193-2200nm), variable temperature (4.2-700K), and high resolution mapping (~100 µm spot size with focusing optics), etc.